Effect of Mask Geometry Variation on Plasma Etching Profiles

Journal article

• Category: Original research article
• Title: Effect of Mask Geometry Variation on Plasma Etching Profiles
• Authors:
  • Bobinac, Josip (m, E360)
  • Reiter, Tobias (m, E360)
  • Piso, Julius (m, E360)
  • Klemenschits, Xaver (m, E360 & external)
  • Baumgartner, Oskar (m, external)
  • Stanojevic, Zlatan (m, external)
  • Strof, Georg (m, external)
  • Karner, Markus (m, external)
  • Filipovic, Lado (m, E360)
• Journal: Micromachines
• Vol: 14
• Issue/Number (optional): 3
• Article Number(optional): 665
• Start Page: 665-1
• End Page: 665-16
• Number of pages: 16
• DOI: 10.3390/mi14030665
• Date of Issue: 16/03/2023
• Language: English
• Keywords: SF6/O2, plasma etching, high-aspect-ratio structures, 3D integration, mask tapering, mask faceting, mask geometry, modeling and simulation, process TCAD
• Open access: yes CC BY 4.0
• Research projects (Name of related research projects including + funding IDs):
  • FFG Bridge Young Scientists 878662
  • Christian Doppler Laboratory for Multi-Scale Process Modeling of Semiconductor Devices and Sensors
• TU Wien Core facilities: VSC
• Research areas, (pick from TU Wien Research Matrix.):
  • Modeling and Simulation (70%)
  • Nanoelectronics (30%)
• Invited: yes
• File attachments:
  • Paper as PDF: micromachines-14-00665-v2-1.pdf
  • Proof of invitation as PDF: Post_MicDAT_invitation.pdf