Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations

Journal article

• Category: Original research article
• Title: Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations
• Authors:
  • Lenz, Christoph (m, E360)
  • Manstetten, Paul (m, E360)
  • Aguinsky, Luiz Felipe (m, E360)
  • Rodrigues, Francio (m, E360)
  • Hössinger, Andreas (m/f, E360)
  • Weinbub, Josef (m, E360)
• Journal: Solid-State Electronics
• Vol: 200
• Start Page: 108534-1
• End Page: 108534-6
• Number of pages: 6
• DOI: 10.1016/j.sse.2022.108534
• Date of Issue: 24/11/2022
• Language: English
• Keywords: Process technology computer-aided design, Topography simulation, Level-set method, Hierarchical grids, Light-emitting diodes
• Open access: no
• Research projects (Name of related research projects including + funding IDs):
  • Christian Doppler Laboratory for High Performance Technology Computer-Aided Design
• TU Wien Core facilities: None
• Research areas, (pick from TU Wien Research Matrix.):
  • Modeling and Simulation (100%)
• Invited: < yes + proof via PDF attachment >
• File attachments:
  • Paper as PDF: paper.pdf
  • Proof of invitation as PDF: invite.pdf