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SOS pseudo-FeFETs after furnace or rapid annealings and thining by thermal oxidation

Journal article

  • Category (PICK ONE FROM LIST; DO NOT CHANGE OR ADD NEW CATEGORY!): < Original research article >
  • Title: SOS Pseudo-FeFETs after Furnace or Rapid Annealings and Thinning by Thermal Oxidation
  • Authors:
    • Antonov, V.A. (m, external)
    • Tikhonenko, F.V. (m, external)
    • Popov, V.P. (m, external)
    • Miakonkikh, A.V (m, external)
    • Rudenko, K.V. (m, external)
    • Sverdlov, Viktor A. (m, E360)
  • Journal: Solid-state Electronics
  • Vol: 215
  • Issue/Number (optional):
  • Article Number(optional): 108821
  • Start Page: 1
  • End Page: 6
  • Number of pages: 6
  • DOI: 10.1016/j.sse.2023.108821
  • Date of Issue: 01/05/2024
  • Language: English
  • Keywords: Sapphire, Ferroelectric, HfO2 interlayer, Phases, Pseudo-MOSFETs
  • Open access: no
  • Research projects (TISS-Project-Acronyms ONLY: TISS->Research->My projects: pick from "Acronym" column (only project leaders can access this information)):
    • NovoMemLog
  • TU Wien Core facilities: None
  • Research areas -- Focal Areas and Fields: (pick from TU Wien Research Matrix's subcategories and assign a percentage share; in total it should add up to 100%.):
    • Materials Characterization (50%), Nanoelectronics (50%)
  • Invited: no
  • File attachments:
Edited by Etl, Clemens