Modeling the impact of incomplete conformality during atomic layer processing

Journal article

• Category: Original research article
• Title: Modeling the Impact of Incomplete Conformality During Atomic Layer Processing
• Authors:
  • Reiter, Tobias (m, E360)
  • Aguinsky, Luiz Felipe (m, E360)
  • Rodrigues, Francio (m, E360)
  • Weinbub, Josef (m, E360)
  • Hössinger, Andreas (m, External)
  • Filipovic, Lado (m, E360)
• Journal: Solid-State Electronics
• Vol: 211
• Article Number(optional): 108816
• Number of pages: 10
• DOI: 10.1016/j.sse.2023.108816
• Date of Issue: 08.11.2023
• Language: English
• Keywords: Atomic layer deposition, 3D NAND fabrication, Thin films, High aspect ratio, Langmuir kinetics, Topography simulation
• Open access: yes CC By 4.0
• Research projects (TISS-Project-Acronyms ONLY: TISS->Research->My projects: pick from "Acronym" column (only project leaders can access this information)):
  • HPTCAD
  • ProMod
• TU Wien Core facilities: None
• Research areas -- Focal Areas and Fields:
  • Modeling and Simulation (50%), Nanoelectronics (50%) >
• Invited: yes
• File attachments:
  • Paper as PDF:1-s2.0-S0038110123002290-main.pdf
  • Proof of invitation as PDF: Invitation_SSE211